Two-Way Communication

by Wolfgang Staud oeMagazine, March 2005 Semiconductor manufacturing experts continue to enhance post-processing resolution enhancement techniques (RET) to improve lithographic results and final silicon yield. Without electronic design automation software, however, even continuous improvements in lithography hardware will be unable to sustain the rapid migration to more advanced nanometer nodes with subwavelength features. A more promising solution to emerging manufacturing challenges lies in the application of lithography methods and design tools that are mutually aware of critical design structures and manufacturing requirements. With the evolution of complementary design-enabled lithography and lithography-enabled design, chip suppliers will be able to take full advantage of advanced manufacturing technologies in the development of next-generation devices. Read the artcicle