Thursday, May 18, 2006

GaAsing Up Cellphones

by Harry Goldstein IEEE Spectrum Online, 1 May 2006 A group of researchers at Freescale Semiconductor Inc., in Austin, Texas, led by Matthias Passlack, have fabricated metal oxide semiconductor field-effect transistors, the types that drive just about every silicon integrated circuit, using gallium arsenide and a novel gate dielectric. Read more